Bulletin of the American Physical Society
63rd Annual Meeting of the APS Division of Fluid Dynamics
Volume 55, Number 16
Sunday–Tuesday, November 21–23, 2010; Long Beach, California
Session RU: Particle Laden Flows III
3:05 PM–4:36 PM, Tuesday, November 23, 2010
Hyatt Regency Long Beach
Room: Regency A
Chair: Evan Variano, University of California, Berkeley
Abstract ID: BAPS.2010.DFD.RU.7
Abstract: RU.00007 : Coffee ring deposition in bands
4:23 PM–4:36 PM
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Abstract
Authors:
Shreyas Mandre
(Brown University)
Ning Wu
(Colorado School of Mines)
Joanna Aizenberg
(Harvard University)
Lakshminarayanan Mahadevan
(Harvard University)
Microscopic particles suspended in a liquid are transported and deposited at a contact line, as the contact line recedes due to evaporation. A particle layer of uniform thickness is deposited if the particle concentration is above a threshold; below this threshold the deposit forms periodic bands oriented parallel to the contact line. We present a model for the formation of these bands based on evaporation leading to the breakup of the thin liquid film near the contact line. The threshold results from a competition between evaporation speed and deposition speed. Using this model, we predict the thickness and length of the bands, making the control of patterned deposition possible.
To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2010.DFD.RU.7
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